HIGH REPETITION RATE CHEMICAL LASER

Authors
  1. Jacobson, T.V.
  2. Kimbell, G.H.
  3. Lambert, A.R.
  4. Snelling, D.R.
Corporate Authors
Defence Research Establishment Valcartier, Valcartier QUE (CAN)
Abstract
A hydrogen fluoride (HF) chemical laser with an active medium 10 cm in length was constructed for operation at high pulse repetition rates using transverse excitation. The device employed 29 resistively loaded electrodes; open-cycle operation was achieved using two 660 l/min mechanical pumps. The optimum performance was obtained with 45 torr of an 11:1 mixture of SF6 and C3H8. Up to 7.2 watts of quasi-continuous wave (CW) power were produced at 1100 Hz on 21 lines of HF in the 2800 nm region. The chemically formed HF was produced by the reaction F + C3H8 yields C3H7 + HF. Single line operation took place when a grating was placed in the optical cavity. Powers as high as 160 mW were obtained on a single transition. Only 13 P branch lines were observed during line-tuning experiments. A substantial portion of the multi-line power output resulted from the increased population inversion created by cascading.
Report Number
TN-2060/73 —
Date of publication
15 May 1973
Number of Pages
9
DSTKIM No
73-04365
CANDIS No
19467
Format(s):
Hardcopy;Originator's fiche received by DSIS

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