A HIGH-REPETITION-RATE CHEMICAL HF LASER

Authors
  1. Jacobson, T.V.
  2. Kimbell, G.H.
  3. Snelling, D.R.
Corporate Authors
Defence Research Establishment Valcartier, Valcartier QUE (CAN)
Abstract
An HF chemical laser with a 10-cm-long active volume has been constructed for operation at high pulse repetition rates using TE excitation. Up to 7.2 W of quasi-CW power were produced at 1100 Hz. Powers as high as 160 mW were obtained on a single transition when the cavity was line tuned. The effect of sequential or cascade lasing was observed.
Date of publication
01 Jan 1975
Number of Pages
2
Reprinted from
IEEE J of Quantum Electronics, vol QE-9, no 4, 1973, p 496-497
DSTKIM No
73-04459
CANDIS No
19523
Format(s):
Hardcopy

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