Optical and Electrical Properties of Sputtered Vanadium Oxide Films

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Authors
  1. Gan, F.Y.
  2. Laou, P.
Corporate Authors
Defence R&D Canada - Valcartier, Valcartier QUE (CAN)
Abstract
Thin films of vanadium oxide with thickness of 0.1 to 0.2 mu m were deposited on Si3, N4/Si substrate by reactive rf magnetron sputtering. The oxide films were sputtered using a vanadium metal target in various ratios of Ar and O2 gases. The O2 content in the mixed atmosphere has a significant influence on the metal-insulator transition characteristics of the oxide films. The oxide film deposited in an Ar/O2 ratio of 98/2 exhibited high optical transmission of 70% to 80% in wavelength from 2 to 10 mu m in insulating state while very low transmission of less than 5% in metallic state. Films prepared with higher 02 concentration showed no metal-insulator transition. In low O2 concentration, films showed characteristics of having both a broader transition region spanning over 30C and a lowered transition temperature which are similar to those of doped vanadium oxide films.
Date of publication
12 Sep 2003
Number of Pages
4
DSTKIM No
CA024517
CANDIS No
522144
Format(s):
Hardcopy;Document Image stored on Optical Disk

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