Thin films Characterization and Optimization for a Dual-Band Microbolometer – Progress report 2012-05

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Authors
  1. Kpetsu, J-B. A.
  2. Zandi, K.
  3. Côté, C.
  4. Sarkissian, A.
Corporate Authors
Defence R&D Canada - Valcartier, Valcartier QUE (CAN);Plasmionique Inc, Varennes Que (CAN)
Abstract
A new FTIR spectrometer with its DTGS detector was successfully used to characterize the IR absorption of optimized nitride layers, which was corroborated by a complementary ellipsometric analysis. The characterization and optimization of the Si3N4 film are therefore completed, especially since its remaining compressive stress has been recently found to be sufficiently minimized for the nitride layer to be successfully patterned by lithographic processes into a suspended membrane without any warping or stress-related problem. VO2 films were found to be near-stoichiometric by composition analyses. It is also concluded from FTIR spectrometer measurements that recently deposited VO2 coatings are highly transparent in the targeted IR spectrum at room temperature, which is expected in their semiconductor state. Upcoming additional measurements with VO2 coatings in their metallic state will help characterize their switching properties for their use as a smart mirror in the final device. All first sputtered Y-Ba-Cu-O samples were shown to be clearly Ba deficient and Y rich by composition analyses. However, most known and important challenges of YBCO deposition are dealt with in a literature review that could be useful for further optimization. Few more samples are planned to be fabricated at significantly increased deposition pressures and analyzed in order to set final YBCO deposition parameters. Few propositions are made to im

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Report Number
DRDC-VALCARTIER-CR-2012-065 — Contractor Report
Date of publication
01 May 2012
Number of Pages
60
DSTKIM No
CA036808
CANDIS No
536471
Format(s):
Electronic Document(PDF)

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